- Precision cutting
- Lapping & polishing
- Wire bonding
- Wafer bonding
- Micro-assembly (flip-chip)
Photolithography
UV & electronic lithography Photolithography mask manufacturing
Packaging
Packaging of optical components
contact : florent.bassignot@femto-engineering.fr
UV & electronic lithography Photolithography mask manufacturing
Deposition of thin and thick layers
Dry etching (ion plasma): RIE, DRIE FIB (Focus Ion Beam) Materials: Silicon (max 6 inches), Glass, Si3N4, LiNbO3,… (max 4
Microscope (MEB, optic, FIB), mechanical profilometer Specific measures : material constraints, optical index, contact angle